X-ray phase analysis of copper oxides films obtained by DC reactive magnetron sputtering
- Авторлар: Lapshin A.1, Karzin V.2, Shapovalov V.2, Baikov P.2
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Мекемелер:
- Institute of Silicate Chemistry
- St. Petersburg Electrotechnical University LETI
- Шығарылым: Том 42, № 1 (2016)
- Беттер: 116-117
- Бөлім: Article
- URL: https://journals.rcsi.science/1087-6596/article/view/215333
- DOI: https://doi.org/10.1134/S1087659616010065
- ID: 215333
Дәйексөз келтіру
Аннотация
The phase composition of the copper oxides films obtained by DC reactive magnetron sputtering at oxygen partial pressures of 0.06, 0.10, and 0.16 mTorr is studied by X-ray phase analysis (XRPA) before and after their heat treatment within the range 300–550°C. It is found that the original phase compositions of the films of each lot are different; after the heat treatment at 550°C, all the films contained only CuO of a monoclinic structure.
Негізгі сөздер
Авторлар туралы
A. Lapshin
Institute of Silicate Chemistry
Хат алмасуға жауапты Автор.
Email: andlap@mail.ru
Ресей, nab. Adm. Makarova 2, St. Petersburg, 199034
V. Karzin
St. Petersburg Electrotechnical University LETI
Email: andlap@mail.ru
Ресей, ul. Professora Popova 5, St. Petersburg, 197376
V. Shapovalov
St. Petersburg Electrotechnical University LETI
Email: andlap@mail.ru
Ресей, ul. Professora Popova 5, St. Petersburg, 197376
P. Baikov
St. Petersburg Electrotechnical University LETI
Email: andlap@mail.ru
Ресей, ul. Professora Popova 5, St. Petersburg, 197376