Enviar artigo por via de e-mail X-ray phase analysis of copper oxides films obtained by DC reactive magnetron sputtering
- Autores: Lapshin A.1, Karzin V.2, Shapovalov V.2, Baikov P.2
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Afiliações:
- Institute of Silicate Chemistry
- St. Petersburg Electrotechnical University LETI
- Edição: Volume 42, Nº 1 (2016)
- Páginas: 116-117
- Seção: Article
- URL: https://journals.rcsi.science/1087-6596/article/view/215333
- DOI: https://doi.org/10.1134/S1087659616010065
- ID: 215333
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Resumo
The phase composition of the copper oxides films obtained by DC reactive magnetron sputtering at oxygen partial pressures of 0.06, 0.10, and 0.16 mTorr is studied by X-ray phase analysis (XRPA) before and after their heat treatment within the range 300–550°C. It is found that the original phase compositions of the films of each lot are different; after the heat treatment at 550°C, all the films contained only CuO of a monoclinic structure.
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Sobre autores
A. Lapshin
Institute of Silicate Chemistry
Autor responsável pela correspondência
Email: andlap@mail.ru
Rússia, nab. Adm. Makarova 2, St. Petersburg, 199034
V. Karzin
St. Petersburg Electrotechnical University LETI
Email: andlap@mail.ru
Rússia, ul. Professora Popova 5, St. Petersburg, 197376
V. Shapovalov
St. Petersburg Electrotechnical University LETI
Email: andlap@mail.ru
Rússia, ul. Professora Popova 5, St. Petersburg, 197376
P. Baikov
St. Petersburg Electrotechnical University LETI
Email: andlap@mail.ru
Rússia, ul. Professora Popova 5, St. Petersburg, 197376
