X-ray phase analysis of copper oxides films obtained by DC reactive magnetron sputtering
- Authors: Lapshin A.E.1, Karzin V.V.2, Shapovalov V.I.2, Baikov P.B.2
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Affiliations:
- Institute of Silicate Chemistry
- St. Petersburg Electrotechnical University LETI
- Issue: Vol 42, No 1 (2016)
- Pages: 116-117
- Section: Article
- URL: https://journals.rcsi.science/1087-6596/article/view/215333
- DOI: https://doi.org/10.1134/S1087659616010065
- ID: 215333
Cite item
Abstract
The phase composition of the copper oxides films obtained by DC reactive magnetron sputtering at oxygen partial pressures of 0.06, 0.10, and 0.16 mTorr is studied by X-ray phase analysis (XRPA) before and after their heat treatment within the range 300–550°C. It is found that the original phase compositions of the films of each lot are different; after the heat treatment at 550°C, all the films contained only CuO of a monoclinic structure.
About the authors
A. E. Lapshin
Institute of Silicate Chemistry
Author for correspondence.
Email: andlap@mail.ru
Russian Federation, nab. Adm. Makarova 2, St. Petersburg, 199034
V. V. Karzin
St. Petersburg Electrotechnical University LETI
Email: andlap@mail.ru
Russian Federation, ul. Professora Popova 5, St. Petersburg, 197376
V. I. Shapovalov
St. Petersburg Electrotechnical University LETI
Email: andlap@mail.ru
Russian Federation, ul. Professora Popova 5, St. Petersburg, 197376
P. B. Baikov
St. Petersburg Electrotechnical University LETI
Email: andlap@mail.ru
Russian Federation, ul. Professora Popova 5, St. Petersburg, 197376