Light-induced formation of nitroxyl radicals by organic Bi(V) compounds in the presence of 2-methyl-2-nitrosopropane and  C -phenyl- N - tert -butylnitrone

A. V. Gushchin; O. S. Kalistratova; A. I. Maleeva; V. A. Dodonov; D. Yu. Kosov; D. N. Emel’yanov; V. A. Kuropatov

doi:10.1134/S1070363217070179

Light-induced formation of nitroxyl radicals by organic Bi(V) compounds in the presence of 2-methyl-2-nitrosopropane and C-phenyl-N-tert-butylnitrone

Authors: Gushchin A.V.¹, Kalistratova O.S.¹, Maleeva A.I.¹, Dodonov V.A.¹, Kosov D.Y.¹, Emel’yanov D.N.¹, Kuropatov V.A.²
Affiliations:
1. Lobachevskii Nizhny Novgorod State University
2. Razuvaev Institute of Organometallic Chemistry
Issue: Vol 87, No 7 (2017)
Pages: 1547-1549
Section: Article
URL: https://journals.rcsi.science/1070-3632/article/view/220728
DOI: https://doi.org/10.1134/S1070363217070179
ID: 220728

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Abstract

The organic bismuth compounds Ph₃Bi(O₂CCH=CHCH₃)₂ and Ph₃Bi(O₂CEt)₂ decompose under scattered light in the presence of spin traps (2-methyl-2-nitrosopropane and C-phenyl-N-tert-butylnitrone) in organic solvents (acetonitrile, benzene, toluene) to form adducts of phenyl radicals with the traps.