Ohmic Contacts to Europium Oxide for Spintronic Devices


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详细

A technique for in situ fabrication of aluminum-based Ohmic contacts to EuO by molecular-beam epitaxy is proposed. These contacts have a linear current–voltage curve and a contact resistance of 0.55 Ω mm and are stable in air. This suggests that the proposed technique holds promise for spintronic applications.

作者简介

A. Andreev

National Research Center Kurchatov Institute

编辑信件的主要联系方式.
Email: andreev_aa@nrcki.ru
俄罗斯联邦, Moscow, 123182

Yu. Grishchenko

National Research Center Kurchatov Institute

Email: andreev_aa@nrcki.ru
俄罗斯联邦, Moscow, 123182

I. Chernykh

National Research Center Kurchatov Institute

Email: andreev_aa@nrcki.ru
俄罗斯联邦, Moscow, 123182

M. Zanaveskin

National Research Center Kurchatov Institute

Email: andreev_aa@nrcki.ru
俄罗斯联邦, Moscow, 123182

E. Lobanovich

National Research Center Kurchatov Institute

Email: andreev_aa@nrcki.ru
俄罗斯联邦, Moscow, 123182


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