Creating Lithographic Pictures Using Faceted Zinc Oxide Microparticles on a Silicon Substrate

A. A. Bobkov; I. A. Pronin; V. A. Moshnikov; N. D. Yakushova; A. A. Karmanov; I. A. Averin; P. A. Somov; E. I. Terukov

doi:10.1134/S1063785018080047

Creating Lithographic Pictures Using Faceted Zinc Oxide Microparticles on a Silicon Substrate

作者: Bobkov A.¹^,2, Pronin I.¹^,2, Moshnikov V.¹^,2, Yakushova N.¹, Karmanov A.¹, Averin I.¹, Somov P.², Terukov E.³
隶属关系:
1. Penza State University
2. St. Petersburg State Electrotechnical University LETI
3. Ioffe Physical Technical Institute
期: 卷 44, 编号 8 (2018)
页面: 694-696
栏目: Article
URL: https://journals.rcsi.science/1063-7850/article/view/207826
DOI: https://doi.org/10.1134/S1063785018080047
ID: 207826

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详细

Lithography techniques compatible with silicon technology have been developed within the hydrothermal method. Topological layouts were formed by faceted microcrystals with the developed surface. The prospects for implementing new hierarchical structures are of special interest.