Creating Lithographic Pictures Using Faceted Zinc Oxide Microparticles on a Silicon Substrate


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Abstract

Lithography techniques compatible with silicon technology have been developed within the hydrothermal method. Topological layouts were formed by faceted microcrystals with the developed surface. The prospects for implementing new hierarchical structures are of special interest.

About the authors

A. A. Bobkov

Penza State University; St. Petersburg State Electrotechnical University LETI

Email: pronin_i90@mail.ru
Russian Federation, Penza, 440026; St. Petersburg, 197022

I. A. Pronin

Penza State University; St. Petersburg State Electrotechnical University LETI

Author for correspondence.
Email: pronin_i90@mail.ru
Russian Federation, Penza, 440026; St. Petersburg, 197022

V. A. Moshnikov

Penza State University; St. Petersburg State Electrotechnical University LETI

Email: pronin_i90@mail.ru
Russian Federation, Penza, 440026; St. Petersburg, 197022

N. D. Yakushova

Penza State University

Email: pronin_i90@mail.ru
Russian Federation, Penza, 440026

A. A. Karmanov

Penza State University

Email: pronin_i90@mail.ru
Russian Federation, Penza, 440026

I. A. Averin

Penza State University

Email: pronin_i90@mail.ru
Russian Federation, Penza, 440026

P. A. Somov

St. Petersburg State Electrotechnical University LETI

Email: pronin_i90@mail.ru
Russian Federation, St. Petersburg, 197022

E. I. Terukov

Ioffe Physical Technical Institute

Email: pronin_i90@mail.ru
Russian Federation, St. Petersburg, 194021


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