Creating Lithographic Pictures Using Faceted Zinc Oxide Microparticles on a Silicon Substrate
- Autores: Bobkov A.1,2, Pronin I.1,2, Moshnikov V.1,2, Yakushova N.1, Karmanov A.1, Averin I.1, Somov P.2, Terukov E.3
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Afiliações:
- Penza State University
- St. Petersburg State Electrotechnical University LETI
- Ioffe Physical Technical Institute
- Edição: Volume 44, Nº 8 (2018)
- Páginas: 694-696
- Seção: Article
- URL: https://journals.rcsi.science/1063-7850/article/view/207826
- DOI: https://doi.org/10.1134/S1063785018080047
- ID: 207826
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Resumo
Lithography techniques compatible with silicon technology have been developed within the hydrothermal method. Topological layouts were formed by faceted microcrystals with the developed surface. The prospects for implementing new hierarchical structures are of special interest.
Sobre autores
A. Bobkov
Penza State University; St. Petersburg State Electrotechnical University LETI
Email: pronin_i90@mail.ru
Rússia, Penza, 440026; St. Petersburg, 197022
I. Pronin
Penza State University; St. Petersburg State Electrotechnical University LETI
Autor responsável pela correspondência
Email: pronin_i90@mail.ru
Rússia, Penza, 440026; St. Petersburg, 197022
V. Moshnikov
Penza State University; St. Petersburg State Electrotechnical University LETI
Email: pronin_i90@mail.ru
Rússia, Penza, 440026; St. Petersburg, 197022
N. Yakushova
Penza State University
Email: pronin_i90@mail.ru
Rússia, Penza, 440026
A. Karmanov
Penza State University
Email: pronin_i90@mail.ru
Rússia, Penza, 440026
I. Averin
Penza State University
Email: pronin_i90@mail.ru
Rússia, Penza, 440026
P. Somov
St. Petersburg State Electrotechnical University LETI
Email: pronin_i90@mail.ru
Rússia, St. Petersburg, 197022
E. Terukov
Ioffe Physical Technical Institute
Email: pronin_i90@mail.ru
Rússia, St. Petersburg, 194021