Contraction of Microwave Discharge in the Reactor for Chemical Vapor Deposition of Diamond
- Авторы: Bogdanov S.1, Gorbachev A.1, Radishev D.1, Vikharev A.1, Lobaev M.1
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Учреждения:
- Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
- Выпуск: Том 45, № 2 (2019)
- Страницы: 89-92
- Раздел: Article
- URL: https://journals.rcsi.science/1063-7850/article/view/208201
- DOI: https://doi.org/10.1134/S1063785019020032
- ID: 208201
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Аннотация
It was found that in a hydrogen-methane mixture in microwave plasma reactor for diamond deposition, there is a threshold pressure after which the contraction of microwave discharge occurs. The results of measurements of gas temperature and spatial distributions of optical emission intensity of discharge are presented. The mechanism of discharge contraction is discussed.
Об авторах
S. Bogdanov
Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
Email: gorb@appl.sci-nnov.ru
Россия, Nizhny Novgorod, 603950
A. Gorbachev
Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
Автор, ответственный за переписку.
Email: gorb@appl.sci-nnov.ru
Россия, Nizhny Novgorod, 603950
D. Radishev
Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
Email: gorb@appl.sci-nnov.ru
Россия, Nizhny Novgorod, 603950
A. Vikharev
Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
Email: gorb@appl.sci-nnov.ru
Россия, Nizhny Novgorod, 603950
M. Lobaev
Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
Email: gorb@appl.sci-nnov.ru
Россия, Nizhny Novgorod, 603950