Contraction of Microwave Discharge in the Reactor for Chemical Vapor Deposition of Diamond
- Авторлар: Bogdanov S.1, Gorbachev A.1, Radishev D.1, Vikharev A.1, Lobaev M.1
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Мекемелер:
- Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
- Шығарылым: Том 45, № 2 (2019)
- Беттер: 89-92
- Бөлім: Article
- URL: https://journals.rcsi.science/1063-7850/article/view/208201
- DOI: https://doi.org/10.1134/S1063785019020032
- ID: 208201
Дәйексөз келтіру
Аннотация
It was found that in a hydrogen-methane mixture in microwave plasma reactor for diamond deposition, there is a threshold pressure after which the contraction of microwave discharge occurs. The results of measurements of gas temperature and spatial distributions of optical emission intensity of discharge are presented. The mechanism of discharge contraction is discussed.
Авторлар туралы
S. Bogdanov
Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
Email: gorb@appl.sci-nnov.ru
Ресей, Nizhny Novgorod, 603950
A. Gorbachev
Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
Хат алмасуға жауапты Автор.
Email: gorb@appl.sci-nnov.ru
Ресей, Nizhny Novgorod, 603950
D. Radishev
Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
Email: gorb@appl.sci-nnov.ru
Ресей, Nizhny Novgorod, 603950
A. Vikharev
Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
Email: gorb@appl.sci-nnov.ru
Ресей, Nizhny Novgorod, 603950
M. Lobaev
Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
Email: gorb@appl.sci-nnov.ru
Ресей, Nizhny Novgorod, 603950