Contraction of Microwave Discharge in the Reactor for Chemical Vapor Deposition of Diamond

S. A. Bogdanov; A. M. Gorbachev; D. B. Radishev; A. L. Vikharev; M. A. Lobaev

doi:10.1134/S1063785019020032

Contraction of Microwave Discharge in the Reactor for Chemical Vapor Deposition of Diamond

Authors: Bogdanov S.A.¹, Gorbachev A.M.¹, Radishev D.B.¹, Vikharev A.L.¹, Lobaev M.A.¹
Affiliations:
1. Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
Issue: Vol 45, No 2 (2019)
Pages: 89-92
Section: Article
URL: https://journals.rcsi.science/1063-7850/article/view/208201
DOI: https://doi.org/10.1134/S1063785019020032
ID: 208201

Cite item

Full Text

Open Access
Restricted Access

Access granted
Restricted Access

Subscription Access

Abstract
About the authors
References
Statistics

Abstract

It was found that in a hydrogen-methane mixture in microwave plasma reactor for diamond deposition, there is a threshold pressure after which the contraction of microwave discharge occurs. The results of measurements of gas temperature and spatial distributions of optical emission intensity of discharge are presented. The mechanism of discharge contraction is discussed.