Influence of a Hydrogen Atmosphere on the Properties of an Aluminum Oxide Film on VT1-0 Titanium
- Авторлар: Sypchenko V.S.1, Tsailun V.1, Nikitenkov N.N.1, Tyurin Y.I.1, Sigfusson T.I.1, Kiseleva E.S.1
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Мекемелер:
- National Research Tomsk Polytechnic University
- Шығарылым: Том 64, № 4 (2019)
- Беттер: 518-522
- Бөлім: Physical Science of Materials
- URL: https://journals.rcsi.science/1063-7842/article/view/203260
- DOI: https://doi.org/10.1134/S1063784219040236
- ID: 203260
Дәйексөз келтіру
Аннотация
In this study, we have considered interaction between an aluminum oxide film magnetron-sputtered on commercially pure VT1-0 titanium and a hydrogen atmosphere. The time the system was exposed to hydrogen varied from 1 to 4 h with all other parameters remaining the same. Data for the distribution of hydrogen over the depth (film thickness) and its content in the thin-film system have been obtained, and the influence of the hold time in hydrogen on the adhesion and friction coefficient of the film has been revealed. In addition, the surface conductivity and hydrogen distribution in the aluminum oxide film have been determined.
Авторлар туралы
V. Sypchenko
National Research Tomsk Polytechnic University
Хат алмасуға жауапты Автор.
Email: Kellymod53@mail.ru
Ресей, Tomsk, 634034
Van Tsailun
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
Ресей, Tomsk, 634034
N. Nikitenkov
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
Ресей, Tomsk, 634034
Yu. Tyurin
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
Ресей, Tomsk, 634034
T. Sigfusson
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
Ресей, Tomsk, 634034
E. Kiseleva
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
Ресей, Tomsk, 634034
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