Influence of a Hydrogen Atmosphere on the Properties of an Aluminum Oxide Film on VT1-0 Titanium


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In this study, we have considered interaction between an aluminum oxide film magnetron-sputtered on commercially pure VT1-0 titanium and a hydrogen atmosphere. The time the system was exposed to hydrogen varied from 1 to 4 h with all other parameters remaining the same. Data for the distribution of hydrogen over the depth (film thickness) and its content in the thin-film system have been obtained, and the influence of the hold time in hydrogen on the adhesion and friction coefficient of the film has been revealed. In addition, the surface conductivity and hydrogen distribution in the aluminum oxide film have been determined.

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V. Sypchenko

National Research Tomsk Polytechnic University

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俄罗斯联邦, Tomsk, 634034

Van Tsailun

National Research Tomsk Polytechnic University

Email: Kellymod53@mail.ru
俄罗斯联邦, Tomsk, 634034

N. Nikitenkov

National Research Tomsk Polytechnic University

Email: Kellymod53@mail.ru
俄罗斯联邦, Tomsk, 634034

Yu. Tyurin

National Research Tomsk Polytechnic University

Email: Kellymod53@mail.ru
俄罗斯联邦, Tomsk, 634034

T. Sigfusson

National Research Tomsk Polytechnic University

Email: Kellymod53@mail.ru
俄罗斯联邦, Tomsk, 634034

E. Kiseleva

National Research Tomsk Polytechnic University

Email: Kellymod53@mail.ru
俄罗斯联邦, Tomsk, 634034

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