Influence of a Hydrogen Atmosphere on the Properties of an Aluminum Oxide Film on VT1-0 Titanium
- 作者: Sypchenko V.S.1, Tsailun V.1, Nikitenkov N.N.1, Tyurin Y.I.1, Sigfusson T.I.1, Kiseleva E.S.1
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隶属关系:
- National Research Tomsk Polytechnic University
- 期: 卷 64, 编号 4 (2019)
- 页面: 518-522
- 栏目: Physical Science of Materials
- URL: https://journals.rcsi.science/1063-7842/article/view/203260
- DOI: https://doi.org/10.1134/S1063784219040236
- ID: 203260
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详细
In this study, we have considered interaction between an aluminum oxide film magnetron-sputtered on commercially pure VT1-0 titanium and a hydrogen atmosphere. The time the system was exposed to hydrogen varied from 1 to 4 h with all other parameters remaining the same. Data for the distribution of hydrogen over the depth (film thickness) and its content in the thin-film system have been obtained, and the influence of the hold time in hydrogen on the adhesion and friction coefficient of the film has been revealed. In addition, the surface conductivity and hydrogen distribution in the aluminum oxide film have been determined.
作者简介
V. Sypchenko
National Research Tomsk Polytechnic University
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Email: Kellymod53@mail.ru
俄罗斯联邦, Tomsk, 634034
Van Tsailun
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
俄罗斯联邦, Tomsk, 634034
N. Nikitenkov
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
俄罗斯联邦, Tomsk, 634034
Yu. Tyurin
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
俄罗斯联邦, Tomsk, 634034
T. Sigfusson
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
俄罗斯联邦, Tomsk, 634034
E. Kiseleva
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
俄罗斯联邦, Tomsk, 634034
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