Influence of a Hydrogen Atmosphere on the Properties of an Aluminum Oxide Film on VT1-0 Titanium
- Autores: Sypchenko V.S.1, Tsailun V.1, Nikitenkov N.N.1, Tyurin Y.I.1, Sigfusson T.I.1, Kiseleva E.S.1
-
Afiliações:
- National Research Tomsk Polytechnic University
- Edição: Volume 64, Nº 4 (2019)
- Páginas: 518-522
- Seção: Physical Science of Materials
- URL: https://journals.rcsi.science/1063-7842/article/view/203260
- DOI: https://doi.org/10.1134/S1063784219040236
- ID: 203260
Citar
Resumo
In this study, we have considered interaction between an aluminum oxide film magnetron-sputtered on commercially pure VT1-0 titanium and a hydrogen atmosphere. The time the system was exposed to hydrogen varied from 1 to 4 h with all other parameters remaining the same. Data for the distribution of hydrogen over the depth (film thickness) and its content in the thin-film system have been obtained, and the influence of the hold time in hydrogen on the adhesion and friction coefficient of the film has been revealed. In addition, the surface conductivity and hydrogen distribution in the aluminum oxide film have been determined.
Sobre autores
V. Sypchenko
National Research Tomsk Polytechnic University
Autor responsável pela correspondência
Email: Kellymod53@mail.ru
Rússia, Tomsk, 634034
Van Tsailun
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
Rússia, Tomsk, 634034
N. Nikitenkov
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
Rússia, Tomsk, 634034
Yu. Tyurin
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
Rússia, Tomsk, 634034
T. Sigfusson
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
Rússia, Tomsk, 634034
E. Kiseleva
National Research Tomsk Polytechnic University
Email: Kellymod53@mail.ru
Rússia, Tomsk, 634034
Arquivos suplementares
