Modification of the Surface Properties of PbSnTe〈In〉 Epitaxial Layers with Composition near Band Inversion
- Авторлар: Tarasov A.1, Ishchenko D.1, Akimov A.1, Akhundov I.1, Golyashov V.1, Klimov A.1, Pashchin N.1, Suprun S.1, Fedosenko E.1, Sherstyakova V.1, Tereshchenko O.1
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Мекемелер:
- Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
- Шығарылым: Том 64, № 11 (2019)
- Беттер: 1704-1708
- Бөлім: Article
- URL: https://journals.rcsi.science/1063-7842/article/view/204700
- DOI: https://doi.org/10.1134/S1063784219110264
- ID: 204700
Дәйексөз келтіру
Аннотация
High-resistance Pb1 –xSnxTe〈In〉 layers grown by molecular beam epitaxy on BaF2(111) substrates with compositions close to band inversion have been investigated. The I–V characteristics and relaxation dependences of the photocurrent of the structures in dependence on the chemical surface treatment and subsequent exposure of the samples in air have been examined. It has been observed that the characteristics significantly transform depending on the physicochemical surface state. It has been found that the chemical surface treatment in the hydrochloric acid solution in isopropyl alcohol leads to an increase in the current by up to four orders of magnitude with the subsequent recovery of the I–V characteristics upon exposure of the samples in air for several days.
Авторлар туралы
A. Tarasov
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: miracle4348@gmail.com
Ресей, Novosibirsk, 660090
D. Ishchenko
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Хат алмасуға жауапты Автор.
Email: miracle4348@gmail.com
Ресей, Novosibirsk, 660090
A. Akimov
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: miracle4348@gmail.com
Ресей, Novosibirsk, 660090
I. Akhundov
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: miracle4348@gmail.com
Ресей, Novosibirsk, 660090
V. Golyashov
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: miracle4348@gmail.com
Ресей, Novosibirsk, 660090
A. Klimov
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: miracle4348@gmail.com
Ресей, Novosibirsk, 660090
N. Pashchin
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: miracle4348@gmail.com
Ресей, Novosibirsk, 660090
S. Suprun
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: miracle4348@gmail.com
Ресей, Novosibirsk, 660090
E. Fedosenko
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: miracle4348@gmail.com
Ресей, Novosibirsk, 660090
V. Sherstyakova
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: miracle4348@gmail.com
Ресей, Novosibirsk, 660090
O. Tereshchenko
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: miracle4348@gmail.com
Ресей, Novosibirsk, 660090