Crystal structure of stacking faults in InGaAs/InAlAs/InAs heterostructures


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Stacking faults and dislocations in InGaAs/InAlAs/InAs heterostructures have been studied by electron microscopy. The use of different techniques of transmission electron microscopy (primarily, highresolution dark-field scanning transmission electron microscopy) has made it possible to determine the defect structure at the atomic level.

作者简介

I. Trunkin

National Research Centre “Kurchatov Institute”

Email: a.vasiliev56@gmail.com
俄罗斯联邦, Moscow, 123182

M. Presniakov

National Research Centre “Kurchatov Institute”

Email: a.vasiliev56@gmail.com
俄罗斯联邦, Moscow, 123182

A. Vasiliev

National Research Centre “Kurchatov Institute”; Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics”

编辑信件的主要联系方式.
Email: a.vasiliev56@gmail.com
俄罗斯联邦, Moscow, 123182; Moscow, 119333

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