Phenomenological description of strain relief in step-graded metamorphic buffer layers based on InxAl1 − xAs ternary solutions
- Авторлар: Aleshin A.N.1, Bugaev A.S.1, Ruban O.A.1, Andreev N.V.2, Shchetinin I.V.2
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Мекемелер:
- Institute for Ultrahigh Frequency Semiconductor Electronics
- National University of Science and Technology MISiS
- Шығарылым: Том 81, № 11 (2017)
- Беттер: 1295-1303
- Бөлім: Article
- URL: https://journals.rcsi.science/1062-8738/article/view/185221
- DOI: https://doi.org/10.3103/S106287381711003X
- ID: 185221
Дәйексөз келтіру
Аннотация
Spatial distributions of the residual elastic strains in layers of step-graded metamorphic buffers of two different designs, grown via molecular beam epitaxy on the basis of InxAl1 − xAs ternary solutions, are obtained by means of reciprocal space mapping. It is shown that with allowance for work hardening, which affects strain relief in buffer layers and increases the strain in dislocation-free layers, the mechanism of strain relief in the final buffer steps, and the residual elastic strain in a buffer dislocation-free layer, are governed by the same phenomenological law as in a single-layer heterostructure.
Авторлар туралы
A. Aleshin
Institute for Ultrahigh Frequency Semiconductor Electronics
Хат алмасуға жауапты Автор.
Email: a.n.aleshin@mail.ru
Ресей, Moscow, 117105
A. Bugaev
Institute for Ultrahigh Frequency Semiconductor Electronics
Email: a.n.aleshin@mail.ru
Ресей, Moscow, 117105
O. Ruban
Institute for Ultrahigh Frequency Semiconductor Electronics
Email: a.n.aleshin@mail.ru
Ресей, Moscow, 117105
N. Andreev
National University of Science and Technology MISiS
Email: a.n.aleshin@mail.ru
Ресей, Moscow, 119049
I. Shchetinin
National University of Science and Technology MISiS
Email: a.n.aleshin@mail.ru
Ресей, Moscow, 119049
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