Phenomenological description of strain relief in step-graded metamorphic buffer layers based on InxAl1 − xAs ternary solutions
- Authors: Aleshin A.N.1, Bugaev A.S.1, Ruban O.A.1, Andreev N.V.2, Shchetinin I.V.2
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Affiliations:
- Institute for Ultrahigh Frequency Semiconductor Electronics
- National University of Science and Technology MISiS
- Issue: Vol 81, No 11 (2017)
- Pages: 1295-1303
- Section: Article
- URL: https://journals.rcsi.science/1062-8738/article/view/185221
- DOI: https://doi.org/10.3103/S106287381711003X
- ID: 185221
Cite item
Abstract
Spatial distributions of the residual elastic strains in layers of step-graded metamorphic buffers of two different designs, grown via molecular beam epitaxy on the basis of InxAl1 − xAs ternary solutions, are obtained by means of reciprocal space mapping. It is shown that with allowance for work hardening, which affects strain relief in buffer layers and increases the strain in dislocation-free layers, the mechanism of strain relief in the final buffer steps, and the residual elastic strain in a buffer dislocation-free layer, are governed by the same phenomenological law as in a single-layer heterostructure.
About the authors
A. N. Aleshin
Institute for Ultrahigh Frequency Semiconductor Electronics
Author for correspondence.
Email: a.n.aleshin@mail.ru
Russian Federation, Moscow, 117105
A. S. Bugaev
Institute for Ultrahigh Frequency Semiconductor Electronics
Email: a.n.aleshin@mail.ru
Russian Federation, Moscow, 117105
O. A. Ruban
Institute for Ultrahigh Frequency Semiconductor Electronics
Email: a.n.aleshin@mail.ru
Russian Federation, Moscow, 117105
N. V. Andreev
National University of Science and Technology MISiS
Email: a.n.aleshin@mail.ru
Russian Federation, Moscow, 119049
I. V. Shchetinin
National University of Science and Technology MISiS
Email: a.n.aleshin@mail.ru
Russian Federation, Moscow, 119049
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