Phenomenological description of strain relief in step-graded metamorphic buffer layers based on InxAl1 − xAs ternary solutions


如何引用文章

全文:

开放存取 开放存取
受限制的访问 ##reader.subscriptionAccessGranted##
受限制的访问 订阅存取

详细

Spatial distributions of the residual elastic strains in layers of step-graded metamorphic buffers of two different designs, grown via molecular beam epitaxy on the basis of InxAl1 − xAs ternary solutions, are obtained by means of reciprocal space mapping. It is shown that with allowance for work hardening, which affects strain relief in buffer layers and increases the strain in dislocation-free layers, the mechanism of strain relief in the final buffer steps, and the residual elastic strain in a buffer dislocation-free layer, are governed by the same phenomenological law as in a single-layer heterostructure.

作者简介

A. Aleshin

Institute for Ultrahigh Frequency Semiconductor Electronics

编辑信件的主要联系方式.
Email: a.n.aleshin@mail.ru
俄罗斯联邦, Moscow, 117105

A. Bugaev

Institute for Ultrahigh Frequency Semiconductor Electronics

Email: a.n.aleshin@mail.ru
俄罗斯联邦, Moscow, 117105

O. Ruban

Institute for Ultrahigh Frequency Semiconductor Electronics

Email: a.n.aleshin@mail.ru
俄罗斯联邦, Moscow, 117105

N. Andreev

National University of Science and Technology MISiS

Email: a.n.aleshin@mail.ru
俄罗斯联邦, Moscow, 119049

I. Shchetinin

National University of Science and Technology MISiS

Email: a.n.aleshin@mail.ru
俄罗斯联邦, Moscow, 119049

补充文件

附件文件
动作
1. JATS XML

版权所有 © Allerton Press, Inc., 2017