Application of Ion-Beam Treatment in the Process of the Magnetron Deposition of Thin SnO2 Films


Citar

Texto integral

Acesso aberto Acesso aberto
Acesso é fechado Acesso está concedido
Acesso é fechado Somente assinantes

Resumo

The effect of accompanying ion-beam treatment on the structure and properties of SnO2 films synthesized by the method of high-frequency magnetron sputtering at room temperature and at 200°C is investigated. It is established that ion-beam processing does not affect the transparency and the band gap of the obtained tin-oxide films. The refractive index and resistivity change. At room temperature, the films are X‑ray amorphous, and at 200°C they are polycrystalline. X-ray diffraction and electron diffraction studies show the presence of a single phase of SnO2. Ion-beam treatment leads to a change in the preferred orientation of the crystallites. With increasing current of ion-beam processing, the grain sizes decrease.

Sobre autores

A. Alalykin

Udmurt State University

Autor responsável pela correspondência
Email: alalykin@udsu.ru
Rússia, Izhevsk, 426034

P. Krylov

Udmurt State University

Autor responsável pela correspondência
Email: ftt@udsu.ru
Rússia, Izhevsk, 426034

R. Zakirova

Udmurt State University

Email: alalykin@udsu.ru
Rússia, Izhevsk, 426034

I. Fedotova

Udmurt State University

Email: alalykin@udsu.ru
Rússia, Izhevsk, 426034

N. Kostenkov

Udmurt State University

Autor responsável pela correspondência
Email: alalykin@udsu.ru
Rússia, Izhevsk, 426034

E. Durman

Udmurt State University

Email: alalykin@udsu.ru
Rússia, Izhevsk, 426034

Arquivos suplementares

Arquivos suplementares
Ação
1. JATS XML

Declaração de direitos autorais © Pleiades Publishing, Ltd., 2019