Formation of nanoparticles containing zinc in Si(001) by ion-beam implantation and subsequent annealing

Resumo

The formation of nanoparticles containing zinc in Si(001) substrates by the implantation of ⁶⁴Zn⁺ ions and subsequent annealing in dry oxygen at 800 and 1000°C for 1 h is studied. The structure of the samples is studied by high-resolution transmission electron microscopy, X-ray diffraction, and photoluminescence spectroscopy. 20-nm zinc nanoparticles located at a depth of about 50 nm are revealed in the as-implanted sample. 10–20-nm pores are observed in the surface layer. Annealing leads to oxidation of the Zn nanoparticles to the Zn₂SiO₄ state. It is shown that the oxidation of Zn nanoparticles begins on their surface and at an annealing temperature of 800°C results in the formation of nanoparticles with the “соre–shell” structure. The X-ray diffraction technique shows simultaneously two Zn and Zn₂SiO₄ phases. ZnO nanoparticles are not formed under the given implantation and annealing conditions.