Fabrication of quasi-optical selective elements for the terahertz range in the form of pseudometallic structures via deep X-ray lithography


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Resumo

A technique for fabricating self-bearing pseudometallic structures, which hold promise for utilization as quasi-optical frequency-selective elements in the terahertz range of the electromagnetic spectrum, is discussed. The technique is based on microstructuring a continuous dielectric layer via stencilled X-ray lithography involving synchrotron radiation with subsequent metallization of the entire structure surface. The main manufacturing schemes are described, including fabrication of the initial substrates and X-ray masks. Examples of samples of the produced selective elements, such as frequency filters and flat lenses, as well as their operating characteristics, are presented.

Sobre autores

A. Gentselev

Budker Institute of Nuclear Physics, Siberian Branch

Autor responsável pela correspondência
Email: A.N.Gentselev@inp.nsk.su
Rússia, Novosibirsk, 630090

S. Kuznetsov

Budker Institute of Nuclear Physics, Siberian Branch; Novosibirsk National Research State University; Design-and-Technology Institute of Applied Microelectronics, Rzhanov Institute of Semiconductor Physics, Siberian Branch

Email: A.N.Gentselev@inp.nsk.su
Rússia, Novosibirsk, 630090; Novosibirsk, 630090; Novosibirsk, 630090

S. Baev

Institute of Automation and Electrometry, Siberian Branch

Email: A.N.Gentselev@inp.nsk.su
Rússia, Novosibirsk, 630090

B. Goldenberg

Budker Institute of Nuclear Physics, Siberian Branch

Email: A.N.Gentselev@inp.nsk.su
Rússia, Novosibirsk, 630090

E. Lonshakov

Novosibirsk National Research State University; Institute of Automation and Electrometry, Siberian Branch

Email: A.N.Gentselev@inp.nsk.su
Rússia, Novosibirsk, 630090; Novosibirsk, 630090

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