Influence of Electromagnetic-Field Nonuniformity on The Interaction Between a H-Wave and a Thin Metal Layer
- Autores: Utkin A.I.1, Yushkanov A.A.2
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Afiliações:
- State University of Humanities and Technology
- Moscow State Regional University
- Edição: Volume 13, Nº 2 (2019)
- Páginas: 221-227
- Seção: Article
- URL: https://journals.rcsi.science/1027-4510/article/view/196252
- DOI: https://doi.org/10.1134/S1027451019020186
- ID: 196252
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Resumo
The interaction between an electromagnetic H-wave and a thin metal layer is calculated taking into account the different reflection coefficients q1 and q2 of its surfaces at different angles θ of wave incidence in the case where the electric field is uniform. The influence of the dependence of the layer’s electrical conductivity on the electric-field nonuniformity on the characteristics of the field—layer interaction is taken into account. The behavior of the coefficients of reflection R, transmission T, and absorption A as functions of the external field frequency, the frequency of bulk collisions of electrons, and the wave incidence angle θ are analyzed.
Sobre autores
A. Utkin
State University of Humanities and Technology
Autor responsável pela correspondência
Email: aiutkin@yandex.ru
Rússia, Orekhovo-Zuevo, Moscow oblast, 142611
A. Yushkanov
Moscow State Regional University
Email: aiutkin@yandex.ru
Rússia, Moscow, 105005
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