On the Possibilities of Multilayer Mirrors for Measuring the Concentration of Boron Impurities in Diamond

Abstract

An X-ray optical scheme for studying boron impurities in diamond substrates by X-ray fluorescence analysis is proposed. The scheme is analyzed and the sensitivity of the method to boron impurities in diamond is determined. The main ways of increasing the sensitivity are considered. It is shown that when a target is excited by AlKα radiation a boron impurity of ~20 ppm can be detected. When СKα radiation is used, the sensitivity is limited by the detector operating speed and is 0.07 ppm. The sensitivity of the X-ray optical scheme is 0.004 ppm.