Anomalous Hall effect in polycrystalline MnxSi1–x (x ≈ 0.5) films with the self-organized distribution of crystallites over their shapes and sizes
- Авторы: Chernoglazov K.Y.1, Drachenko O.2, Bugaev A.S.3,4, Vedeneev A.S.4, Novodvorskii O.A.5, Granovskii A.B.6, Matveev Y.A.3, Pashaev E.M.1, Chesnokov Y.M.1, Vasil’ev A.L.1, Tugushev V.V.1, Zenkevich A.V.3, Semisalova A.S.6,7, Rylkov V.V.1,4, Nikolaev S.N.1, Zhou S.7
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Учреждения:
- National Research Centre Kurchatov Institute
- Laboratoire National des Champs Magnétiques Intenses
- Moscow Institute of Physics and Technology
- Kotel’nikov Institute of Radio Engineering and Electronics
- Institute on Laser and Information Technologies
- Lomonosov Moscow State University
- Institute of Ion Beam Physics and Materials Research
- Выпуск: Том 103, № 7 (2016)
- Страницы: 476-483
- Раздел: Condensed Matter
- URL: https://journals.rcsi.science/0021-3640/article/view/159216
- DOI: https://doi.org/10.1134/S0021364016070055
- ID: 159216
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Аннотация
The structural, transport, and magnetic characteristics of polycrystalline MnxSi1–x (x ≈ 0.51–0.52) films grown by pulsed laser deposition onto Al2O3(0001) substrates when the low-energy components are deposited owing to collisions with the atoms of the buffer gas have been studied in the “shadow” geometry. The magnetization of these films is determined by two ferromagnetic phases—the high-temperature phase with the Curie temperature TC ≈ 370 K and the low-temperature one with TC ≈ 46 K. The anomalous Hall effect changes sign from positive to negative with a decrease in temperature. The sign change occurs in the temperature range of 30–50 K; the specific value of this temperature depends on the thickness of the MnxSi1–x film. The results can be interpreted in terms of the structural self-organization related to the formation of two layers in the course of film growth. These layers have nearly the same chemical composition but significantly differ in the shapes and sizes of crystallites. This leads to a drastic difference in the values of TC and in the value and the sign of the anomalous Hall effect for such layers.
Об авторах
K. Chernoglazov
National Research Centre Kurchatov Institute
Email: vvrylkov@mail.ru
Россия, pl. Kurchatova 1, Moscow, 123182
O. Drachenko
Laboratoire National des Champs Magnétiques Intenses
Email: vvrylkov@mail.ru
Франция, avenue de Rangueil 143, Toulouse, 31400
A. Bugaev
Moscow Institute of Physics and Technology; Kotel’nikov Institute of Radio Engineering and Electronics
Email: vvrylkov@mail.ru
Россия, Institutskii per. 9, Dolgoprudnyi, Moscow region, 141700; pl. Vvedenskogo 1, Fryazino, Moscow region, 141190
A. Vedeneev
Kotel’nikov Institute of Radio Engineering and Electronics
Email: vvrylkov@mail.ru
Россия, pl. Vvedenskogo 1, Fryazino, Moscow region, 141190
O. Novodvorskii
Institute on Laser and Information Technologies
Email: vvrylkov@mail.ru
Россия, Svyatoozerskaya ul. 1, Shatura, Moscow region, 140700
A. Granovskii
Lomonosov Moscow State University
Email: vvrylkov@mail.ru
Россия, Moscow, 119991
Yu. Matveev
Moscow Institute of Physics and Technology
Email: vvrylkov@mail.ru
Россия, Institutskii per. 9, Dolgoprudnyi, Moscow region, 141700
E. Pashaev
National Research Centre Kurchatov Institute
Email: vvrylkov@mail.ru
Россия, pl. Kurchatova 1, Moscow, 123182
Yu. Chesnokov
National Research Centre Kurchatov Institute
Email: vvrylkov@mail.ru
Россия, pl. Kurchatova 1, Moscow, 123182
A. Vasil’ev
National Research Centre Kurchatov Institute
Email: vvrylkov@mail.ru
Россия, pl. Kurchatova 1, Moscow, 123182
V. Tugushev
National Research Centre Kurchatov Institute
Email: vvrylkov@mail.ru
Россия, pl. Kurchatova 1, Moscow, 123182
A. Zenkevich
Moscow Institute of Physics and Technology
Email: vvrylkov@mail.ru
Россия, Institutskii per. 9, Dolgoprudnyi, Moscow region, 141700
A. Semisalova
Lomonosov Moscow State University; Institute of Ion Beam Physics and Materials Research
Email: vvrylkov@mail.ru
Россия, Moscow, 119991; Dresden, 01328
V. Rylkov
National Research Centre Kurchatov Institute; Kotel’nikov Institute of Radio Engineering and Electronics
Автор, ответственный за переписку.
Email: vvrylkov@mail.ru
Россия, pl. Kurchatova 1, Moscow, 123182; pl. Vvedenskogo 1, Fryazino, Moscow region, 141190
S. Nikolaev
National Research Centre Kurchatov Institute
Email: vvrylkov@mail.ru
Россия, pl. Kurchatova 1, Moscow, 123182
S. Zhou
Institute of Ion Beam Physics and Materials Research
Email: vvrylkov@mail.ru
Германия, Dresden, 01328
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