Anomalous Hall effect in polycrystalline MnxSi1–x (x ≈ 0.5) films with the self-organized distribution of crystallites over their shapes and sizes


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The structural, transport, and magnetic characteristics of polycrystalline MnxSi1–x (x ≈ 0.51–0.52) films grown by pulsed laser deposition onto Al2O3(0001) substrates when the low-energy components are deposited owing to collisions with the atoms of the buffer gas have been studied in the “shadow” geometry. The magnetization of these films is determined by two ferromagnetic phases—the high-temperature phase with the Curie temperature TC ≈ 370 K and the low-temperature one with TC ≈ 46 K. The anomalous Hall effect changes sign from positive to negative with a decrease in temperature. The sign change occurs in the temperature range of 30–50 K; the specific value of this temperature depends on the thickness of the MnxSi1–x film. The results can be interpreted in terms of the structural self-organization related to the formation of two layers in the course of film growth. These layers have nearly the same chemical composition but significantly differ in the shapes and sizes of crystallites. This leads to a drastic difference in the values of TC and in the value and the sign of the anomalous Hall effect for such layers.

Sobre autores

K. Chernoglazov

National Research Centre Kurchatov Institute

Email: vvrylkov@mail.ru
Rússia, pl. Kurchatova 1, Moscow, 123182

O. Drachenko

Laboratoire National des Champs Magnétiques Intenses

Email: vvrylkov@mail.ru
França, avenue de Rangueil 143, Toulouse, 31400

A. Bugaev

Moscow Institute of Physics and Technology; Kotel’nikov Institute of Radio Engineering and Electronics

Email: vvrylkov@mail.ru
Rússia, Institutskii per. 9, Dolgoprudnyi, Moscow region, 141700; pl. Vvedenskogo 1, Fryazino, Moscow region, 141190

A. Vedeneev

Kotel’nikov Institute of Radio Engineering and Electronics

Email: vvrylkov@mail.ru
Rússia, pl. Vvedenskogo 1, Fryazino, Moscow region, 141190

O. Novodvorskii

Institute on Laser and Information Technologies

Email: vvrylkov@mail.ru
Rússia, Svyatoozerskaya ul. 1, Shatura, Moscow region, 140700

A. Granovskii

Lomonosov Moscow State University

Email: vvrylkov@mail.ru
Rússia, Moscow, 119991

Yu. Matveev

Moscow Institute of Physics and Technology

Email: vvrylkov@mail.ru
Rússia, Institutskii per. 9, Dolgoprudnyi, Moscow region, 141700

E. Pashaev

National Research Centre Kurchatov Institute

Email: vvrylkov@mail.ru
Rússia, pl. Kurchatova 1, Moscow, 123182

Yu. Chesnokov

National Research Centre Kurchatov Institute

Email: vvrylkov@mail.ru
Rússia, pl. Kurchatova 1, Moscow, 123182

A. Vasil’ev

National Research Centre Kurchatov Institute

Email: vvrylkov@mail.ru
Rússia, pl. Kurchatova 1, Moscow, 123182

V. Tugushev

National Research Centre Kurchatov Institute

Email: vvrylkov@mail.ru
Rússia, pl. Kurchatova 1, Moscow, 123182

A. Zenkevich

Moscow Institute of Physics and Technology

Email: vvrylkov@mail.ru
Rússia, Institutskii per. 9, Dolgoprudnyi, Moscow region, 141700

A. Semisalova

Lomonosov Moscow State University; Institute of Ion Beam Physics and Materials Research

Email: vvrylkov@mail.ru
Rússia, Moscow, 119991; Dresden, 01328

V. Rylkov

National Research Centre Kurchatov Institute; Kotel’nikov Institute of Radio Engineering and Electronics

Autor responsável pela correspondência
Email: vvrylkov@mail.ru
Rússia, pl. Kurchatova 1, Moscow, 123182; pl. Vvedenskogo 1, Fryazino, Moscow region, 141190

S. Nikolaev

National Research Centre Kurchatov Institute

Email: vvrylkov@mail.ru
Rússia, pl. Kurchatova 1, Moscow, 123182

S. Zhou

Institute of Ion Beam Physics and Materials Research

Email: vvrylkov@mail.ru
Alemanha, Dresden, 01328

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