Impurity Distribution in Multicrystalline Silicon Growth


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This paper presents experimental data on the growth of multicrystalline silicon with tailored electrical properties using starting silicon of purity better than 99.999 at %. Our calculations demonstrate that the effective distribution coefficients of Fe-group impurities decrease with increasing impurity concentration in the starting charge.

作者简介

A. Nepomnyashchikh

Vinogradov Institute of Geochemistry, Siberian Branch

Email: ropr@igc.ork.ru
俄罗斯联邦, ul. Favorskogo 1a, Irkutsk, 664033

R. Presnyakov

Vinogradov Institute of Geochemistry, Siberian Branch

编辑信件的主要联系方式.
Email: ropr@igc.ork.ru
俄罗斯联邦, ul. Favorskogo 1a, Irkutsk, 664033

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