Chemical composition of an inductively coupled hexamethyldisilazane–argon plasma and properties of films grown in this plasma

Abstract

The simplest components (atoms, diatomic molecules, and simple free radicals) of an inductively coupled rf plasma in a hexamethyldisilazane–argon mixture have been identified by optical emission spectroscopy. We have studied the influence of process conditions (plasma power and hexamethyldisilazane concentration in the mixture) on the intensity of lines and bands corresponding to these components and the corresponding changes in the composition and physicochemical properties of SiC_xN_yH_z films grown in this plasma.