Chemical composition of an inductively coupled hexamethyldisilazane–argon plasma and properties of films grown in this plasma
- Авторы: Shayapov V.R.1, Chagin M.N.1, Rumyantsev Y.M.1
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Учреждения:
- Nikolaev Institute of Inorganic Chemistry, Siberian Branch
- Выпуск: Том 52, № 6 (2016)
- Страницы: 630-636
- Раздел: Article
- URL: https://journals.rcsi.science/0020-1685/article/view/157724
- DOI: https://doi.org/10.1134/S0020168516050150
- ID: 157724
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Аннотация
The simplest components (atoms, diatomic molecules, and simple free radicals) of an inductively coupled rf plasma in a hexamethyldisilazane–argon mixture have been identified by optical emission spectroscopy. We have studied the influence of process conditions (plasma power and hexamethyldisilazane concentration in the mixture) on the intensity of lines and bands corresponding to these components and the corresponding changes in the composition and physicochemical properties of SiCxNyHz films grown in this plasma.
Об авторах
V. Shayapov
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Автор, ответственный за переписку.
Email: shayapov@niic.nsc.ru
Россия, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090
M. Chagin
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Email: shayapov@niic.nsc.ru
Россия, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090
Yu. Rumyantsev
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Email: shayapov@niic.nsc.ru
Россия, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090
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