Optoelectronics, Instrumentation and Data Processing
ISSN 8756-6990 (Print)
ISSN 1934-7944 (Online)
Menu
Archives
Home
About the Journal
Editorial Team
Editorial Policies
Author Guidelines
About the Journal
Issues
Search
Current
Retracted articles
Archives
Contact
All Journals
User
Username
Password
Remember me
Forgot password?
Register
Notifications
View
Subscribe
Search
Search
Search Scope
All
Authors
Title
Abstract
Index terms
Full Text
Browse
By Issue
By Author
By Title
By Sections
Other Journals
Subscription
Login to verify subscription
Keywords
Fourier optics
Raman scattering
computer simulation
diffraction efficiency
diffractive optical element
diffusion
digital holography
dimensional inspection
hyperspectral images
image processing
image reconstruction
laser writing
light diffraction
mathematical model
maximum likelihood method
nanomaterials
perturbation functions
remote sensing
scanning speed
silicon
terahertz radiation
×
User
Username
Password
Remember me
Forgot password?
Register
Notifications
View
Subscribe
Search
Search
Search Scope
All
Authors
Title
Abstract
Index terms
Full Text
Browse
By Issue
By Author
By Title
By Sections
Other Journals
Subscription
Login to verify subscription
Keywords
Fourier optics
Raman scattering
computer simulation
diffraction efficiency
diffractive optical element
diffusion
digital holography
dimensional inspection
hyperspectral images
image processing
image reconstruction
laser writing
light diffraction
mathematical model
maximum likelihood method
nanomaterials
perturbation functions
remote sensing
scanning speed
silicon
terahertz radiation
Home
>
Search
>
Author Details
Author Details
Kondrat’ev, V. I.
Issue
Section
Title
File
Vol 54, No 2 (2018)
Optical Information Technologies
Formation of Thick High-Aspect-Ratio Resistive Masks by the Contact Photolithography Method
TOP
