Optoelectronics, Instrumentation and Data Processing
ISSN 8756-6990 (Print)
ISSN 1934-7944 (Online)
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Keywords
Fourier optics
Raman scattering
computer simulation
diffraction efficiency
diffractive optical element
diffusion
digital holography
dimensional inspection
hyperspectral images
image processing
image reconstruction
laser writing
light diffraction
mathematical model
maximum likelihood method
nanomaterials
perturbation functions
remote sensing
scanning speed
silicon
terahertz radiation
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Keywords
Fourier optics
Raman scattering
computer simulation
diffraction efficiency
diffractive optical element
diffusion
digital holography
dimensional inspection
hyperspectral images
image processing
image reconstruction
laser writing
light diffraction
mathematical model
maximum likelihood method
nanomaterials
perturbation functions
remote sensing
scanning speed
silicon
terahertz radiation
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Author Details
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Lemzyakov, A. G.
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Vol 54, No 2 (2018)
Optical Information Technologies
Formation of Thick High-Aspect-Ratio Resistive Masks by the Contact Photolithography Method
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