Monte Carlo simulation of the formation of AIIIBV nanostructures with the use of droplet epitaxy

Abstract

A Monte Carlo lattice model is proposed to describe the formation of semiconductor nanostructures by the vapor–liquid–solid growth mechanism. This model is used to simulate the growth of GaAs nanostructures by the droplet epitaxy technique in the temperature range from 500 to 600 K in As₂ fluxes with intensity of 0.005–0.04 ML/s. The morphology of the formed structures is demonstrated to depend on the growth parameters. Etching of the GaAs substrate by a gallium droplet is studied. The ranges of temperature and As flux rates necessary for the formation of GaAs nanorings are determined. The conditions of the formation of single and double concentric rings are analyzed.