| 期 |
栏目 |
标题 |
文件 |
| 卷 7, 编号 2 (2016) |
Materials of Electronic |
Charge characteristics of MOS structure with thermal SiO2 films doped with phosphorus under high-field electron injection |
|
| 卷 7, 编号 3 (2016) |
Effects of Energy Fluxes on Materials |
Damage of Al2O3 ceramics under the action of pulsed ion and plasma fluxes and laser irradiation |
|
| 卷 7, 编号 5 (2016) |
Materials of Power Engineering and Radiation-Resistant Materials |
Radiation resistance of structural radiation-protective composite material based on magnetite matrix |
|
| 卷 8, 编号 2 (2017) |
Materials of Power Engineering and RadiationResistant Materials |
Attenuation of photon and neutron radiation using iron–magnetite–serpentinite radiation-protective composite |
|
| 卷 8, 编号 3 (2017) |
Plasmochemical Methods of Production and Treatment of Materials |
The influence of a powerful stream of deuterium ions and deuterium plasma on the structural state of the surface layer of titanium |
|
| 卷 8, 编号 5 (2017) |
Materials of Power Engineering and Radiation-Resistant Materials |
Radiation hardening of constructional cement–magnetite–serpentinite composite under gamma irradiation at increased dose |
|
| 卷 9, 编号 2 (2018) |
Materials of Power Engineering and Radiation-Resistant Materials |
Synthesis of Stable Bismuth Silicate with Sillenite Structure in the Na2O–Bi2O3–SiO2 System |
|
| 卷 9, 编号 3 (2018) |
Effects of Energy Fluxes on Materials |
Features of the Damage and the Structural Changes in the Tungsten Surface Layer under the Pulsed Action of Laser Radiation, Ion and Plasma Fluxes |
|
| 卷 9, 编号 5 (2018) |
Materials of Power Engineering and Radiation-Resistant Materials |
Structural Features of Mineral Crystalline Phases and Defectiveness of Bismuth Organosiliconate Crystals at High Temperatures |
|
| 卷 10, 编号 3 (2019) |
Effects of Energy Fluxes on Materials |
Influence of Pulsed Beams of Deuterium Ions and Deuterium Plasma on the Aluminum Alloy of Al–Mg–Li System |
|
| 卷 10, 编号 5 (2019) |
Electronic Engineering Materials |
The Kinetics of Growth of a Nanosized Germanium Film Deposited on the Si(001) Surface by Magnetron Sputtering |
|
