Formation of Nanocrystalline Structures under Germanium and Indium Electrodeposition
- Autores: Bakanov V.I.1, Nesterova N.V.1
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Afiliações:
- Tyumen’ State University
- Edição: Volume 54, Nº 3 (2018)
- Páginas: 365-372
- Seção: Nanoscale and Nanostructured Materials and Coatings
- URL: https://journals.rcsi.science/2070-2051/article/view/203983
- DOI: https://doi.org/10.1134/S2070205118030036
- ID: 203983
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Resumo
The processes of electrodeposition of Ge and Ge–In from ammonia-tartrate solutions have been studied. The nature of interactions in thin-film systems obtained by germanium and indium codeposition has been investigated by means of potentiodynamic voltammetry in the inversion mode. The role of electrodesurface modification has been emphasized for deposition of a germanium film of a preset thickness from aqueous solutions. As was shown by the atomic force microscopy study, glossy films with a nanocrystalline structure had been formed. It has been established that, to develop silicon–germanium technologies, deposition of thin films must be performed from ionic liquids.
Sobre autores
V. Bakanov
Tyumen’ State University
Email: larina_nat@mail.ru
Rússia, Tyumen’, 625003
N. Nesterova
Tyumen’ State University
Autor responsável pela correspondência
Email: larina_nat@mail.ru
Rússia, Tyumen’, 625003
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