Formation of Nanocrystalline Structures under Germanium and Indium Electrodeposition
- Authors: Bakanov V.I.1, Nesterova N.V.1
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Affiliations:
- Tyumen’ State University
- Issue: Vol 54, No 3 (2018)
- Pages: 365-372
- Section: Nanoscale and Nanostructured Materials and Coatings
- URL: https://journals.rcsi.science/2070-2051/article/view/203983
- DOI: https://doi.org/10.1134/S2070205118030036
- ID: 203983
Cite item
Abstract
The processes of electrodeposition of Ge and Ge–In from ammonia-tartrate solutions have been studied. The nature of interactions in thin-film systems obtained by germanium and indium codeposition has been investigated by means of potentiodynamic voltammetry in the inversion mode. The role of electrodesurface modification has been emphasized for deposition of a germanium film of a preset thickness from aqueous solutions. As was shown by the atomic force microscopy study, glossy films with a nanocrystalline structure had been formed. It has been established that, to develop silicon–germanium technologies, deposition of thin films must be performed from ionic liquids.
About the authors
V. I. Bakanov
Tyumen’ State University
Email: larina_nat@mail.ru
Russian Federation, Tyumen’, 625003
N. V. Nesterova
Tyumen’ State University
Author for correspondence.
Email: larina_nat@mail.ru
Russian Federation, Tyumen’, 625003
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