Formation of Nanocrystalline Structures under Germanium and Indium Electrodeposition
- 作者: Bakanov V.I.1, Nesterova N.V.1
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隶属关系:
- Tyumen’ State University
- 期: 卷 54, 编号 3 (2018)
- 页面: 365-372
- 栏目: Nanoscale and Nanostructured Materials and Coatings
- URL: https://journals.rcsi.science/2070-2051/article/view/203983
- DOI: https://doi.org/10.1134/S2070205118030036
- ID: 203983
如何引用文章
详细
The processes of electrodeposition of Ge and Ge–In from ammonia-tartrate solutions have been studied. The nature of interactions in thin-film systems obtained by germanium and indium codeposition has been investigated by means of potentiodynamic voltammetry in the inversion mode. The role of electrodesurface modification has been emphasized for deposition of a germanium film of a preset thickness from aqueous solutions. As was shown by the atomic force microscopy study, glossy films with a nanocrystalline structure had been formed. It has been established that, to develop silicon–germanium technologies, deposition of thin films must be performed from ionic liquids.
作者简介
V. Bakanov
Tyumen’ State University
Email: larina_nat@mail.ru
俄罗斯联邦, Tyumen’, 625003
N. Nesterova
Tyumen’ State University
编辑信件的主要联系方式.
Email: larina_nat@mail.ru
俄罗斯联邦, Tyumen’, 625003
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