Numerical Simulation of Vapor-Phase Epitaxy with Allowance for Diffusion Processes
- Authors: Kuvyrkin G.N.1, Savelyeva I.Y.1, Zhuravsky A.V.1
-
Affiliations:
- Bauman State Technical University
- Issue: Vol 10, No 3 (2018)
- Pages: 299-307
- Section: Article
- URL: https://journals.rcsi.science/2070-0482/article/view/202322
- DOI: https://doi.org/10.1134/S2070048218030080
- ID: 202322
Cite item
Abstract
We propose a heat-conduction model that takes into account the features of the heat and mass transfer during vapor-phase epitaxy on a curvilinear surface. Using the integro-interpolation method, a difference scheme is constructed and the numerical solution of the stated problem is found. The approximation and the stability of the difference scheme are investigated. Examples of the numerical computation for various materials are presented.
About the authors
G. N. Kuvyrkin
Bauman State Technical University
Email: inga.savelyeva@gmail.com
Russian Federation, Moscow, 105005
I. Y. Savelyeva
Bauman State Technical University
Author for correspondence.
Email: inga.savelyeva@gmail.com
Russian Federation, Moscow, 105005
A. V. Zhuravsky
Bauman State Technical University
Email: inga.savelyeva@gmail.com
Russian Federation, Moscow, 105005
Supplementary files
