Numerical Simulation of Vapor-Phase Epitaxy with Allowance for Diffusion Processes
- Авторлар: Kuvyrkin G.N.1, Savelyeva I.Y.1, Zhuravsky A.V.1
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Мекемелер:
- Bauman State Technical University
- Шығарылым: Том 10, № 3 (2018)
- Беттер: 299-307
- Бөлім: Article
- URL: https://journals.rcsi.science/2070-0482/article/view/202322
- DOI: https://doi.org/10.1134/S2070048218030080
- ID: 202322
Дәйексөз келтіру
Аннотация
We propose a heat-conduction model that takes into account the features of the heat and mass transfer during vapor-phase epitaxy on a curvilinear surface. Using the integro-interpolation method, a difference scheme is constructed and the numerical solution of the stated problem is found. The approximation and the stability of the difference scheme are investigated. Examples of the numerical computation for various materials are presented.
Негізгі сөздер
Авторлар туралы
G. Kuvyrkin
Bauman State Technical University
Email: inga.savelyeva@gmail.com
Ресей, Moscow, 105005
I. Savelyeva
Bauman State Technical University
Хат алмасуға жауапты Автор.
Email: inga.savelyeva@gmail.com
Ресей, Moscow, 105005
A. Zhuravsky
Bauman State Technical University
Email: inga.savelyeva@gmail.com
Ресей, Moscow, 105005
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