Pseudo-diffusion mode of contact melting in the presence of electro-migration
- Authors: Savvin V.S.1,2
-
Affiliations:
- National Research Nuclear University (MEPhI)
- Institute of Nuclear Power Engineering
- Issue: Vol 24, No 2 (2017)
- Pages: 303-308
- Section: Article
- URL: https://journals.rcsi.science/1531-8699/article/view/216946
- DOI: https://doi.org/10.1134/S0869864317020135
- ID: 216946
Cite item
Abstract
The growth rate of the liquid contact layer may be influenced by an electric current at contact melting. Depending on the direction, the electric current speeds up or slows down the liquid layer growth in comparison with the diffusion regime (no-current mode). It is shown that if the current flowing in the "accelerating" direction is decreased inversely proportional to the square root of time, the time law of the liquid layer growth will be identical to the diffusion mode. The proposed pseudo-diffusion mode is implemented for the bismuth-indium system at 75°C. Results of calculations of the mobility and the effective charge of the melt ions are presented.
About the authors
V. S. Savvin
National Research Nuclear University (MEPhI); Institute of Nuclear Power Engineering
Author for correspondence.
Email: savvin-vs@yandex.ru
Russian Federation, Moscow; Obninsk