Crystal structure and mechanical properties of titanium nitride films synthesized by magnetron sputtering with a hot target

Abstract

The effect of nitrogen consumption and the discharge current density on the crystal structure of titanium nitride films synthesized by the method of reactive magnetron sputtering of a hot target at a constant current is studied by X-ray phase analysis. It is found that the phase of titanium nitride of a cubic crystal system is formed in the films. An increase in the current density leads to the texturing of the crystals parallel to the (111) plane in the films. In this case, the hardness and the modulus of normal elasticity are increased significantly.