Email this article Synthesis of Si–C–N–Fe films from volatile organosilicon substances-precursors and ferrocene. Part II. Properties of SiCxNyFez films obtained by thermal decomposition of tris(diethylamino)silane and ferrocene
- Authors: Pushkarev R.V.1, Fainer N.I.1, Golubenko A.N.2, Rumyantsev Y.M.1, Nadolinnyi V.A.1, Maksimovskii E.A.1, Korotaev E.V.1, Kaichev V.V.2,3
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Affiliations:
- Nikolaev Institute of Inorganic Chemistry, Siberian Branch
- Novosibirsk National Research State University
- Boreskov Institute of Catalysis, Siberian Branch
- Issue: Vol 42, No 5 (2016)
- Pages: 490-496
- Section: Article
- URL: https://journals.rcsi.science/1087-6596/article/view/215711
- DOI: https://doi.org/10.1134/S1087659616050126
- ID: 215711
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Abstract
Thermodynamic modeling of the deposition of condensed phases of complex composition has been carried out in the Si–C–N–Fe–H–(He) system in the temperature range of 500–1300 K under total pressure of 10–2–10–1 Torr in the system using initial gas mixture of tris(diethylamino)silane HSi[N(C2H5)2]3, ferrocene (C5H5)2Fe, and helium. Derived from the results of thermodynamic modeling, the method for the preparation of SiCxNyFez films using the high-temperature decomposition of the gas mixture of TDEAS, ferrocene, and helium at low pressure in the temperature range of 1073–1273 K has been developed. The dependence of the chemical and phase composition of the films on the conditions of synthesis has been determined using various methods of chemical analysis such as IR spectroscopy, Raman scattering, scanning electron microscopy, energy dispersion spectroscopy, X-ray phase analysis using synchrotron radiation, and X-ray photoelectron spectroscopy (XPS). The magnetic properties of the films have been studied by Faraday’s method and electron paramagnetic resonance. It has been shown that the films are paramagnetic at the temperature of synthesis of 1123 K, while at the deposition temperature of 1273 K they are ferromagnetic. The mechanical properties of the films were characterized by nanoindentation technique.
About the authors
R. V. Pushkarev
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Author for correspondence.
Email: pushkarev@niic.nsc.ru
Russian Federation, Novosibirsk, 630090
N. I. Fainer
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Email: pushkarev@niic.nsc.ru
Russian Federation, Novosibirsk, 630090
A. N. Golubenko
Novosibirsk National Research State University
Email: pushkarev@niic.nsc.ru
Russian Federation, Novosibirsk, 630090
Yu. M. Rumyantsev
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Email: pushkarev@niic.nsc.ru
Russian Federation, Novosibirsk, 630090
V. A. Nadolinnyi
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Email: pushkarev@niic.nsc.ru
Russian Federation, Novosibirsk, 630090
E. A. Maksimovskii
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Email: pushkarev@niic.nsc.ru
Russian Federation, Novosibirsk, 630090
E. V. Korotaev
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Email: pushkarev@niic.nsc.ru
Russian Federation, Novosibirsk, 630090
V. V. Kaichev
Novosibirsk National Research State University; Boreskov Institute of Catalysis, Siberian Branch
Email: pushkarev@niic.nsc.ru
Russian Federation, Novosibirsk, 630090; Novosibirsk, 630090
