Enviar artigo por via de e-mail Synthesis of Photosensitive Cyclopropane-Containing Polymers
- Autores: Guliyev K.G.1, Rzayeva A.E.1, Guliyev A.M.1
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Afiliações:
- Institute of Polymer Materials
- Edição: Volume 92, Nº 9 (2019)
- Páginas: 1215-1222
- Seção: Macromolecular Compounds and Polymeric Materials
- URL: https://journals.rcsi.science/1070-4272/article/view/216910
- DOI: https://doi.org/10.1134/S1070427219090052
- ID: 216910
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Resumo
New cyclopropyl methacrylate monomers were prepared, their radical polymerization was performed, and the composition and structure of the polymers obtained, containing reactive UV-sensitive fragments, were determined. Experiments on photochemical cross-linking revealed photosensitivity of the polymers synthesized. The materials based on them are optically transparent and can be used in microelectronics and optics.
Sobre autores
K. Guliyev
Institute of Polymer Materials
Autor responsável pela correspondência
Email: ipoma@science.az
Azerbaijão, Sumgayit
A. Rzayeva
Institute of Polymer Materials
Email: ipoma@science.az
Azerbaijão, Sumgayit
A. Guliyev
Institute of Polymer Materials
Email: ipoma@science.az
Azerbaijão, Sumgayit
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