Synthesis of Photosensitive Cyclopropane-Containing Polymers

K. G. Guliyev; A. E. Rzayeva; A. M. Guliyev

doi:10.1134/S1070427219090052

Synthesis of Photosensitive Cyclopropane-Containing Polymers

Authors: Guliyev K.G.¹, Rzayeva A.E.¹, Guliyev A.M.¹
Affiliations:
1. Institute of Polymer Materials
Issue: Vol 92, No 9 (2019)
Pages: 1215-1222
Section: Macromolecular Compounds and Polymeric Materials
URL: https://journals.rcsi.science/1070-4272/article/view/216910
DOI: https://doi.org/10.1134/S1070427219090052
ID: 216910

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Abstract

New cyclopropyl methacrylate monomers were prepared, their radical polymerization was performed, and the composition and structure of the polymers obtained, containing reactive UV-sensitive fragments, were determined. Experiments on photochemical cross-linking revealed photosensitivity of the polymers synthesized. The materials based on them are optically transparent and can be used in microelectronics and optics.