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Vol 91, No 7 (2018)
Volatile Heteroligand Complexes of Copper(II): New Precursors for Chemical Vapor Deposition of Copper Films
Krisyuk B.V., Turgambaeva A.E., Stabnikov P.A., Igumenov I.K., Sysoev S.V., Rumyantsev Y.M., Prokhorova S.A., Maksimovskii E.A., Maslova O.V.
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(Eng)
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