Author Details

Alexandrov, S. E.

Issue	Section	Title	File
Vol 89, No 6 (2016)	Inorganic Synthesis and Industrial Inorganic Chemistry	Optimization of technological parameters in plasma chemical etching of quartz single crystals
Vol 89, No 8 (2016)	Various Technological Processes	Plasma chemical etching of photoresist layers based on diazonaphthoquinones in an installation with remote oxygen plasma
Vol 89, No 9 (2016)	Inorganic Synthesis and Industrial Inorganic Chemistry	Fundamental physicochemical regularities of the chemical vapor deposition of nickel oxide layers
Vol 89, No 12 (2016)	Inorganic Synthesis and Industrial Inorganic Chemistry	Control over structural-dimensional characteristics of tungsten disulfide particles in aerosol-assisted chemical vapor deposition
Vol 90, No 6 (2017)	Inorganic Synthesis and Industrial Inorganic Chemistry	Gas-sensitive properties of thin nickel oxide films
Vol 90, No 11 (2017)	Inorganic Synthesis and Industrial Inorganic Chemistry	Low-Temperature Plasma-Chemical Deposition of Nanocomposite Antifriction Molybdenum Disulfide (Filler)–Silicon Oxide (Matrix) Coatings