Fundamental physicochemical regularities of the chemical vapor deposition of nickel oxide layers


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Abstract

Physicochemical regularities of the chemical vapor deposition (CVD) of nickel oxide layers in the (EtCp)2Ni–O3–O2–Ar reaction system at a reduced pressure were studied. Dependences of growth rate of NiO layers on deposition temperature, linear gas flow velocity, and roughness were derived. A mass-spectrometric study of the composition of the reaction gas phases formed in these systems provided evidence about the fundamental physicochemical regularities of the CVD process, which is important for solving applied problems associated with the development of technological equipment and industrial technology for deposition of NiO layers.

About the authors

A. S. Kondrateva

Peter the Great St. Petersburg Polytechnic University

Author for correspondence.
Email: a_kondrateva@spbstu.ru
Russian Federation, ul. Politekhnicheskaya 29/1, St. Petersburg, 195251

S. E. Alexandrov

Peter the Great St. Petersburg Polytechnic University

Email: a_kondrateva@spbstu.ru
Russian Federation, ul. Politekhnicheskaya 29/1, St. Petersburg, 195251

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