4-(Trimethylsilyl)morpholine: synthesis, characterization, and prospects of use in film deposition processes
- Авторлар: Rakhlin V.I.1, Tsyrendorzhieva I.P.1, Sysoev S.V.2, Rumyantsev Y.M.2, Maslova O.V.2, Kosinova M.L.2
- 
							Мекемелер: 
							- A.E. Favorsky Irkutsk Institute of Chemistry, Siberian Branch, Russian Academy of Sciences
- A.V. Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
 
- Шығарылым: Том 66, № 12 (2017)
- Беттер: 2283-2289
- Бөлім: Full Article
- URL: https://journals.rcsi.science/1066-5285/article/view/241781
- DOI: https://doi.org/10.1007/s11172-017-2015-1
- ID: 241781
Дәйексөз келтіру
Аннотация
4-(Trimethylsilyl)morpholine (TMSM) was synthesized and shown to be applicable as a precursor for plasma-enhanced chemical vapor deposition of films. The temperature depen dence of the saturated vapor pressure of TMSM was determined by tensimetry and the thermodynamic characteristics of its evaporation were calculated. Thermodynamic modeling (calculation of the "equilibrium" compositions of the condensed and gas phases) was carried out for broad ranges of temperatures (300—1200 K), pressures (10–2—10 Torr), and input gas (inert gas, H2, NH3) to precursor flow ratios (0—50). The calculation results were used to predict the composition of deposited condensed products occurring in equilibrium with the gas phase depending on the composition of the initial gas mixture and reaction conditions.
Авторлар туралы
V. Rakhlin
A.E. Favorsky Irkutsk Institute of Chemistry, Siberian Branch, Russian Academy of Sciences
							Хат алмасуға жауапты Автор.
							Email: vir@irioch.irk.ru
				                					                																			                												                	Ресей, 							1 ul. Favorskogo, Irkutsk, 664033						
I. Tsyrendorzhieva
A.E. Favorsky Irkutsk Institute of Chemistry, Siberian Branch, Russian Academy of Sciences
														Email: vir@irioch.irk.ru
				                					                																			                												                	Ресей, 							1 ul. Favorskogo, Irkutsk, 664033						
S. Sysoev
A.V. Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
														Email: vir@irioch.irk.ru
				                					                																			                												                	Ресей, 							3 ul. Akad. Lavrent’va, Novosibirsk, 630090						
Yu. Rumyantsev
A.V. Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
														Email: vir@irioch.irk.ru
				                					                																			                												                	Ресей, 							3 ul. Akad. Lavrent’va, Novosibirsk, 630090						
O. Maslova
A.V. Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
														Email: vir@irioch.irk.ru
				                					                																			                												                	Ресей, 							3 ul. Akad. Lavrent’va, Novosibirsk, 630090						
M. Kosinova
A.V. Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
														Email: vir@irioch.irk.ru
				                					                																			                												                	Ресей, 							3 ul. Akad. Lavrent’va, Novosibirsk, 630090						
Қосымша файлдар
 
				
			 
						 
						 
						 
					 
						 
									 
  
  
  
  
  Мақаланы E-mail арқылы жіберу
			Мақаланы E-mail арқылы жіберу  Ашық рұқсат
		                                Ашық рұқсат Рұқсат берілді
						Рұқсат берілді Тек жазылушылар үшін
		                                		                                        Тек жазылушылар үшін
		                                					