A CVD Process for Producing Atomic Current Sources Based on  63 Ni

I. D. Kharitonov; V. A. Mazgunova; V. A. Babain; A. I. Kostylev; A. O. Merkushkin; A. A. Shemukhin; Yu. V. Balakshin; A. V. Kozhemyako; S. N. Kalmykov; E. P. Magomedbekov

doi:10.1134/S1066362218020054

A CVD Process for Producing Atomic Current Sources Based on ⁶³Ni

Autores: Kharitonov I.D.¹, Mazgunova V.A.², Babain V.A.², Kostylev A.I.², Merkushkin A.O.³, Shemukhin A.A.⁴, Balakshin Y.V.⁴, Kozhemyako A.V.⁴, Kalmykov S.N.¹, Magomedbekov E.P.³
Afiliações:
1. Chemical Faculty
2. Khlopin Radium Institute
3. Mendeleev University of Chemical Technology of Russia
4. Skobeltsyn Institute of Nuclear Physics
Edição: Volume 60, Nº 2 (2018)
Páginas: 158-163
Seção: Article
URL: https://journals.rcsi.science/1066-3622/article/view/224410
DOI: https://doi.org/10.1134/S1066362218020054
ID: 224410

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A CVD process was developed for producing ⁶³Ni-based atomic batteries by deposition of active ⁶³Ni layers onto semiconductor silicon supports. Tetrakis(trifluorophosphine)nickel synthesized from ⁶³Ni metal and phosphorus trifluoride was used as the volatile precursor. The influence of the support temperature and working pressure on the characteristics of the ⁶³Ni coating was examined.