Adhesion at the Ta(Mo)/NiTi Interface

Аннотация

The atomic and electronic structures of Me(110)/NiTi(110) and TiO₂(100)/Me(110) interfaces (where Me = Ta, Mo) have been studied by the projector augmented-wave method in the framework of the density functional theory. It is established that the formation of intermediate oxide layers at the metal–oxide interface can lead to decreased adhesion at the interface.