Simulations of dynamic resistive evaporation in a vacuum
- Авторы: Kazanskiy N.1, Kolpakov V.2, Krichevskiy S.2, Podlipnov V.1,2
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Учреждения:
- Image Processing Systems Institute, Branch of the Federal Research Center “Crystallography and Photonics,”
- Samara State Aerospace University
- Выпуск: Том 62, № 10 (2017)
- Страницы: 1490-1495
- Раздел: Gases and Liquids
- URL: https://journals.rcsi.science/1063-7842/article/view/200093
- DOI: https://doi.org/10.1134/S1063784217100140
- ID: 200093
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Аннотация
The model of dynamic resistive evaporation in vacuum has been considered, and the model takes into account the structural peculiarities of the corresponding evaporator. In the model, the dependences to determine the time of material heating up to evaporation temperature as well as dynamic characteristics of the evaporation have been obtained. It has been shown that the obtained characteristics are nonharmonic and periodically repeated. The adequacy of the developed model to the physical model has been corroborated. It has been found that the discrepancy between the experimental and calculated time characteristics of shutter movement is not higher than 5%. The recommendations for using the suggested model to fabricate of thin films of multicomponent materials via thermal evaporation have been considered.
Об авторах
N. Kazanskiy
Image Processing Systems Institute, Branch of the Federal Research Center “Crystallography and Photonics,”
Email: kolpakov683@gmail.com
Россия, Samara, 443001
V. Kolpakov
Samara State Aerospace University
Автор, ответственный за переписку.
Email: kolpakov683@gmail.com
Россия, Samara, 443086
S. Krichevskiy
Samara State Aerospace University
Email: kolpakov683@gmail.com
Россия, Samara, 443086
V. Podlipnov
Image Processing Systems Institute, Branch of the Federal Research Center “Crystallography and Photonics,”; Samara State Aerospace University
Email: kolpakov683@gmail.com
Россия, Samara, 443001; Samara, 443086