Simulations of dynamic resistive evaporation in a vacuum

Abstract

The model of dynamic resistive evaporation in vacuum has been considered, and the model takes into account the structural peculiarities of the corresponding evaporator. In the model, the dependences to determine the time of material heating up to evaporation temperature as well as dynamic characteristics of the evaporation have been obtained. It has been shown that the obtained characteristics are nonharmonic and periodically repeated. The adequacy of the developed model to the physical model has been corroborated. It has been found that the discrepancy between the experimental and calculated time characteristics of shutter movement is not higher than 5%. The recommendations for using the suggested model to fabricate of thin films of multicomponent materials via thermal evaporation have been considered.