Tunnel Emission from Nanostructured Field-Emission Array Cathodes with a Fluorine–Carbon Coating
- Authors: Yafarov R.K.1
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Affiliations:
- Kotel’nikov Institute of Radio Engineering and Electronics, Saratov Branch, Russian Academy of Sciences
- Issue: Vol 64, No 6 (2019)
- Pages: 897-901
- Section: Physical Electronics
- URL: https://journals.rcsi.science/1063-7842/article/view/203648
- DOI: https://doi.org/10.1134/S1063784219060240
- ID: 203648
Cite item
Abstract
Variations of the morphology and field-emission properties of surface-structured n- and p-type silicon wafers have been studied. The silicon surface has been structured by etching in a fluorine–carbon plasma and depositing subnanodimensional island carbon masks. It has been shown that surface structuring in a fluorine–carbon plasma makes it possible to reach desired field-emission currents in electric fields of different strengths. Physicochemical models of field emission mechanisms and models of destruction of surface-modified multipoint silicon array cathodes have been considered.
About the authors
R. K. Yafarov
Kotel’nikov Institute of Radio Engineering and Electronics, Saratov Branch, Russian Academy of Sciences
Author for correspondence.
Email: pirpc@yandex.ru
Russian Federation, Saratov, 410019